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Rich & Repair Mask Aprés-shampooing

Composition

AQUA/WATER/EAU, *******, BENZYL ALCOHOL, CETYL ALCOHOL, CITRIC ACID, *******, HELIANTHUS ANNUUS (SUNFLOWER) SEED OIL, HYDROGENATED ETHYLHEXYL OLIVATE, *******, ISOPROPYL ALCOHOL, LACTOBACILLUS FERMENT LYSATE, LEUCONOSTOC/RADISH ROOT FERMENT FILTRATE, *******, PARFUM/FRAGRANCE, PHENOXYETHANOL, PROPYLENE GLYCOL, SODIUM BENZOATE, STEARYL ALCOHOL, TAPIOCA STARCH, THEOBROMA GRANDIFLORUM SEED BUTTER, *******, TOCOPHERYL ACETATE (*).

(*) Ingredients are displayed in alphabetical order and some have been deliberately hidden (*******), to get the exact composition, please use our applications.

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